Optical emission end point detecting for monitoring oxygen plasma a-C:H stripping

✍ Scribed by Marco AR Alves; Edmundo da Silva Braga; Alfeu Fissore; Lucila Cescato

• Book ID: 104265958
• Publisher: Elsevier Science
• Year: 1998
• Tongue: English
• Weight: 225 KB
• Volume: 49
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(97)00139-5

✦ Synopsis

The stripping ofamorphous hydrogenated carbon films (a-C:H) using an rf oxygen plasma has been monitored using the optical emission from electronically excited CO, Hand 0 species in the visible region of the spectrum. The end point has been detected by monitoring the emission intensity of 0 reactive species f777.2nml and CO emission (483.5nm) intensity of the etching product.