Optical analysis of Al-layer oxidation during Nb/Al2O3-Al/Nb Josephson junction fabrication

✍ Scribed by R. Dolata; M. Neuhaus; W. Jutzi

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 250 KB
• Volume: 34
• Category: Article
• ISSN: 0011-2275
• DOI: 10.1016/0011-2275(94)90069-8

✦ Synopsis

The oxidation of thin AI layers on niobium has been investigated by reflectivity measurements. The simple experimental set-up allows for in situ observation of tunnel barrier growth with good time resolution. The dynamics of the AI203 layer growth is examined as a function of 02 pressure. The observed reflectivity change during oxidation is correlated with the critical Josephson current density.