Open-air silicon etching by H2–He–CH4 flowing cold plasma

✍ Scribed by Khaliq Chaudhary; Kiyoto Inomata; Mamoru Yoshimoto; Hideomi Koinuma

• Book ID: 117357609
• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 241 KB
• Volume: 57
• Category: Article
• ISSN: 0167-577X
• DOI: 10.1016/s0167-577x(03)00085-5