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On the relation between deposition conditions and (mechanical) stress in plasma silicon nitride layers

✍ Scribed by W.A.P. Claassen; W.G.J.M. Valkenburg; W.M.v.d. Wijgert; M.F.C. Willemsen


Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
432 KB
Volume
129
Category
Article
ISSN
0040-6090

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