On the Mechanism of the Disproportionation of Chlorinated Silanes under the Influence of Lewis Bases

✍ Scribed by H. Hildebrandt; B. Engels

• Publisher: John Wiley and Sons
• Year: 2000
• Tongue: German
• Weight: 111 KB
• Volume: 626
• Category: Article
• ISSN: 0372-7874
• DOI: 10.1002/(sici)1521-3749(200002)626:2<400::aid-zaac400>3.0.co;2-5

✦ Synopsis

In the present work the influence of Lewis bases on the reaction mechanism of the disproportionation of halodisilanes into silylenes and monosilanes is studied. The reaction profile of the disproportionation reaction is computed in the absence as well as in the presence of Lewis bases such as NH 3 , PH 3 , and OPH 3 . Differences between the reaction mechanisms are discussed in terms of the barrier heights and the geometrical and electronic structures of the transition states and products. The relevance of possible pre-complexes between the Lewis base and the disilane is discussed and competitive reactions are addressed.