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On the interaction of hydrogen RF plasma with implantation-induced defects in MOS structures : P. Danesh, S. Kaschieva and A. Djakov. Solid-St. Electron.28(11), 1095 (1985)


Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
59 KB
Volume
26
Category
Article
ISSN
0026-2714

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