The lithographic effect of electron beam in line exposures in scanning electron micruicopy (SEM) on poly(methy1 methacrylate) (PMMA) was evaluated using the line width in a film deposited on a silicium substrate and from the line profiles in a PMMA plate. It was found that the effect of the dose on
On the excitation of the Fe Kα line in AGNs by the impact of beams of highly relativistic electrons on the disk
✍ Scribed by A. I. Gómez de Castro; A. Antonicci
- Publisher
- John Wiley and Sons
- Year
- 2006
- Tongue
- English
- Weight
- 122 KB
- Volume
- 327
- Category
- Article
- ISSN
- 0004-6337
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