The effect of Ar flow rate in the growth
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Zeguo Tang; Wenbin Wang; Desheng Wang; Dequan Liu; Qiming Liu; Min Yin; Deyan He
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Article
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2010
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Elsevier Science
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English
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In this article, by investigating the influence of Ar flow rate on deposition rate and structural properties of hydrogenated silicon germanium (SiGe:H) films, we showed that the addition of Ar in the diluted gas efficiently improve the deposition rate and crystallinity due to an enhanced dissociatio