𝔖 Bobbio Scriptorium
✦   LIBER   ✦

On the comparison of two methods of off-line parameter identification

✍ Scribed by J.S Allison

Publisher
Elsevier Science
Year
1967
Tongue
English
Weight
352 KB
Volume
18
Category
Article
ISSN
0022-247X

No coin nor oath required. For personal study only.

πŸ“œ SIMILAR VOLUMES

On-line identification of distributed pa
On-line identification of distributed parameter systems
✍ M.H. Hamza; M.A. Sheirah πŸ“‚ Article πŸ“… 1973 πŸ› Elsevier Science 🌐 English βš– 694 KB

Non-linear programming can be used for the on-line identification of distributed parameter systems and can lead to an optimum identifier. Summary--A method is suggested for the identification of distributed parameter systems. The method is suitable for on-line identification and uses non-linear pro

Comparison of two identification methods
Comparison of two identification methods for PID controller tuning
✍ Jietae Lee; Su Whan Sung πŸ“‚ Article πŸ“… 1993 πŸ› American Institute of Chemical Engineers 🌐 English βš– 201 KB πŸ‘ 3 views

Proportional integral and derivative (PID) controllers are still used widely in industry. For automatic tuning of the PID controllers, simple methods, instead of elaborate adaptive methods, are usually used. Significant efforts have been lately devoted to easy testing and better tuning. Yuwana and

COMPARISON OF SENSITIVITY EQUATION AND A
COMPARISON OF SENSITIVITY EQUATION AND ADJOINT EQUATION METHODS FOR PARAMETER IDENTIFICATION PROBLEMS
✍ AKIRA ANJU; MUTSUTO KAWAHARA πŸ“‚ Article πŸ“… 1997 πŸ› John Wiley and Sons 🌐 English βš– 127 KB

This paper deals with the inverse analysis of a thermal conduction problem, in which the thermal conductivity is identiΓΏed as an unknown parameter, which is determined so as to minimize the cost function represented by the square of the di erence between the computed and observed temperatures at pre

On-line state and parameter Identificati
On-line state and parameter Identification of positive photoresist development
✍ Thomas A. Carroll; W. Fred Ramirez πŸ“‚ Article πŸ“… 1990 πŸ› American Institute of Chemical Engineers 🌐 English βš– 623 KB

The development phase of the optical photolithography process has long been considered the most crucial, as it is the final image-forming step. Process monitoring methods have focused primarily on end point detection and have not used other inferable on-line information. This paper examines the use