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On-line convergent beam thickness measurement on the CM microscope

✍ Scribed by MaxT. Otten

Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
209 KB
Volume
31
Category
Article
ISSN
0304-3991

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The lithographic effect of electron beam in line exposures in scanning electron micruicopy (SEM) on poly(methy1 methacrylate) (PMMA) was evaluated using the line width in a film deposited on a silicium substrate and from the line profiles in a PMMA plate. It was found that the effect of the dose on