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On epitaxial Si1−xGex thin film growth by chemical vapour deposition from a silane, germane, hydrogen chloride and hydrogen gas mixture

✍ Scribed by H. Kühne; Th. Morgenstern; P. Zaumseil; D. Krüger; G. Ritter; H. Richter


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
540 KB
Volume
19
Category
Article
ISSN
0921-5107

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