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On contact lithography of high-aspect-ratio features with incoherent broadband ultraviolet illumination

✍ Scribed by Fei Wang; Katherine E. Weaver; Akhlesh Lakhtakia; Mark W. Horn


Book ID
104050241
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
322 KB
Volume
77
Category
Article
ISSN
0167-9317

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