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Observation of Si cluster formation in SiO[sub 2] films through annealing process using x-ray photoelectron spectroscopy and infrared techniques

✍ Scribed by Furukawa, Katsuhiko; Liu, Yichun; Nakashima, Hiroshi; Gao, Dawei; Uchino, Kiichiro; Muraoka, Katsunori; Tsuzuki, Hirohisa


Book ID
126300402
Publisher
American Institute of Physics
Year
1998
Tongue
English
Weight
250 KB
Volume
72
Category
Article
ISSN
0003-6951

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