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Observation of reactions between Ti/Permalloy bilayer thin films annealed at low temperatures

✍ Scribed by Masahiro Kitada; Noboru Shimizu; Teruho Shimotsu


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
500 KB
Volume
188
Category
Article
ISSN
0040-6090

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Titanium oxynitride (TiN x O y ) thin films were deposited by low-pressure metalΒ±organic CVD (LP-MOCVD) on (100) silicon, sapphire, and polycrystalline alumina substrates. Titanium isopropoxide (TIP) and ammonia were used as precursors. The influence of the growth temperature, ranking from 450 C to