Numerical and experimental studies for the anisotropic etching of silicon with the AFM oxide lines as masks

✍ Scribed by Jen Fin Lin; Pal Jen Wei; Chih Kuang Tai; Jung Ching Chung

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 978 KB
• Volume: 85
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2007.04.146