✦ LIBER ✦
Novolac-Based photoresists combining chemical amplification and dissolution inhibition
✍ Scribed by Michael J. O'brien
- Publisher
- Society for Plastic Engineers
- Year
- 1989
- Tongue
- English
- Weight
- 409 KB
- Volume
- 29
- Category
- Article
- ISSN
- 0032-3888
No coin nor oath required. For personal study only.