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Novel Metal-Organic Chemical Vapor Deposition / T1F Annealing Route to Thin Films of Tl1Ba2Ca2Cu3O9+x

✍ Scribed by Richard J. McNeely; J. A. Belot; J. L. Schindler; M. P. Chudzik; C. R. Kannewurf; X. F. Zhang; D. J. Miller; Tobin J. Marks


Book ID
110423232
Publisher
Springer
Year
1998
Tongue
English
Weight
369 KB
Volume
11
Category
Article
ISSN
0896-1107

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πŸ“œ SIMILAR VOLUMES


In-situ growth of Y1Ba2Cu3O7βˆ’x thin film
✍ Aiguo Feng; Li Luo; J. Martin; C.J. Maggiore πŸ“‚ Article πŸ“… 1992 πŸ› Elsevier Science 🌐 English βš– 565 KB

A temperature-controlled chemical vapor deposition (TC-CVD) process was developed for in-situ growth of highly c-axis orientated YtBa2Cu30~+x (YBCO) thin films directly on sapphire substrates. This new CVD process, for the first time, uses programmable temperature controllers to optimize and tailor