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Novel low-temperature C-V technique for MOS doping profile determination near the Si/SiO2 interface

✍ Scribed by Pirovano, A.; Lacaita, A.L.; Pacelli, A.; Benvenuti, A.


Book ID
114538630
Publisher
IEEE
Year
2001
Tongue
English
Weight
173 KB
Volume
48
Category
Article
ISSN
0018-9383

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