Normal and Inverted Meyer-Neldel Rule in Hot-Wire CVD Deposited Nanocrystalline Silicon

✍ Scribed by Brüggemann, R. ;Brüggemann, R. ;Rojahn, M. ;Rösch, M.

• Publisher: John Wiley and Sons
• Year: 1998
• Tongue: English
• Weight: 109 KB
• Volume: 166
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/(sici)1521-396x(199804)166:2<r11::aid-pssa999911>3.0.co;2-h