130 nm, ~20 X & ±1 ) and SiO 2 (~15 nm) films. The deposition was performed by RF sputtering in 2.5 deposition cycles (1 cycle » 0.8 lm) at a deposition rate of 1.5 nm s ±1 and a pressure below 1.0 10 ±5 torr. Aluminum anodization was carried out in a 10 % phosphoric acid solution at 130 V and 7 C.
✦ LIBER ✦
Nonclassical Conducting Polymers: New Approaches to Organic Metals?
✍ Scribed by Martin Baumgarten; Nikolai Tyutyulkov
- Publisher
- John Wiley and Sons
- Year
- 1998
- Tongue
- English
- Weight
- 90 KB
- Volume
- 4
- Category
- Article
- ISSN
- 0947-6539
No coin nor oath required. For personal study only.
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