Forming limit plays a very important role in metal forming processes since it can be used to predict whether a blank will fracture or not. This paper examines the influence on forming limit of blank and fractured thickness. The fractured thickness of a specimen in the simple tension test is adopted
Noise analysis in metal deposition—expectations and limits
✍ Scribed by E. Budevski; W. Obretenov; W. Bostanov; G. Staikov; J. Doneit; K. Jüttner; W.J. Lorenz
- Book ID
- 103064111
- Publisher
- Elsevier Science
- Year
- 1989
- Tongue
- English
- Weight
- 596 KB
- Volume
- 34
- Category
- Article
- ISSN
- 0013-4686
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✦ Synopsis
The application of electrochemical noise analysis (ENA) on the electrocrystallization processes of metals is discussed on the basis of the well-known nucleation and growth mechanisms studied experimentally by transient techniques of silver deposition on quasi-perfect silver single crystal faces. Simulations of simolified 2-D nucleation and mononuclear growth mechanisms show that the nucleation and propagition rates are reflected in the power spectrumand the autocorrelation function. The analysis of data becomes difficult if both the nucleation and propagation rates are Poissonian distributed. First experimental results obtained for the silver deposition on quasi-perfect silver single crystal faces and the copper deposition on polycrystalline microelectrodes are reported.
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