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Nitrogen saturation behaviour near the SiO2/Si-interface during N2O-rapid thermal oxidation

✍ Scribed by G. Weidner; R. Kurps; K. Blum; D. Krüger


Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
354 KB
Volume
22
Category
Article
ISSN
0167-9317

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