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Nitrogen incorporation during N20- and NO-oxidation of silicon at temperatures down to 600°C

✍ Scribed by G. Weidner; D. Krüger; M. Weidner; T. Grabolla


Publisher
Elsevier Science
Year
1996
Tongue
English
Weight
672 KB
Volume
27
Category
Article
ISSN
0026-2692

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