✦ LIBER ✦
Nickel silicide thin films as masking and structural layers for silicon bulk micro-machining by potassium hydroxide wet etching
✍ Scribed by Bhaskaran, M; Sriram, S; Sim, L W
- Book ID
- 121409469
- Publisher
- Institute of Physics
- Year
- 2008
- Tongue
- English
- Weight
- 897 KB
- Volume
- 18
- Category
- Article
- ISSN
- 0960-1317
No coin nor oath required. For personal study only.