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Nickel and copper deposition on fine alumina particles by using the chemical vapor deposition-circulation fluidized bed reactor technique

✍ Scribed by Yee-Wen Yen; Sinn-Wen Chen


Book ID
111536529
Publisher
Springer
Year
2000
Tongue
English
Weight
364 KB
Volume
35
Category
Article
ISSN
0022-2461

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