๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

New vacuum chambers available


Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
128 KB
Volume
7
Category
Article
ISSN
1369-7021

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โœฆ Synopsis


Analysis under pressure

Hitachi High-Technologies Corp. has launched a variable pressure, field emission scanning electron microscope that gives excellent resolution and provides sufficient beam current for a range of analytical techniques. The S-4300SE/N has a large operating pressure range of 10-1000 Pa. The variable pressure capability allows difficult wet, oily, or nonconductive specimens to be imaged without sample preparation. The microscope can be fitted with an environmental secondary electron detector for obtaining secondary electron images at high pressure. It can also be equipped for energy dispersive X-ray, wavelength dispersive X-ray (WDX), cathodoluminescence, and electron backscattered diffraction analysis, while beam blanking plates can be added for e-beam lithography. The parallel beam WDX system enables elemental analysis with improved resolution for the separation of light elements and better spatial resolution for mapping.


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