✦ LIBER ✦
New Ti-SALICIDE process using Sb and Ge preamorphization for sub-0.2 μm CMOS technology
✍ Scribed by Qiuxia Xu; Chenning Hu
- Book ID
- 114537429
- Publisher
- IEEE
- Year
- 1998
- Tongue
- English
- Weight
- 239 KB
- Volume
- 45
- Category
- Article
- ISSN
- 0018-9383
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