New technique for the characterization of Si/SiGe layers using heterostructure MOS capacitors

✍ Scribed by S.P. Voinigescu; K. Iniewski; R. Lisak; C.A.T. Salama; J.-P. Noél; D.C. Houghton

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 592 KB
• Volume: 37
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(94)90157-0