New semiconductor materials in microelectronics
β Scribed by Prof. Dr. L. N. Aleksandrov
- Publisher
- John Wiley and Sons
- Year
- 1976
- Tongue
- English
- Weight
- 630 KB
- Volume
- 11
- Category
- Article
- ISSN
- 0232-1300
No coin nor oath required. For personal study only.
β¦ Synopsis
Abstract
Properties of nonβsilicon systems are discussed. In addition to Si, the use of materials possessing a higher mobility and a shorter lifetime (Ge, GaAs and other), permits to increase working frequencies and switching speed, to expand the temperature range of the microelectronic devices operation. The problem can be solved by obtaining thin and homogenous epitaxial semiconductor films and insulating layers.
π SIMILAR VOLUMES
Major scaling issues, which need to be addressed to continue scaling according to Moore's law, include increase of 2 transistor leakage due to use of thin gate oxide (about 1 nm limit for SiO ), power (reaching 100 W/ cm ) and RC delay 2 (dielectric constant limit is 1 for air and Cu resistivity inc
For several decades, the main body of research in photoelectrochemical (PEC) hydrogen production has centered on a small number of semiconductor materials classes, including stable but inefficient metal-oxides, as well as some more efficient materials such as III-V compounds which suffer from high c