New photoimageable dielectric insulating copolyester thin films: Synthesis and characterization

✍ Scribed by Frank F. Shi; Lizabeth A. Schneggenburger; James Economy

• Publisher: John Wiley and Sons
• Year: 1997
• Tongue: English
• Weight: 350 KB
• Volume: 63
• Category: Article
• ISSN: 0021-8995
• DOI: 10.1002/(sici)1097-4628(19970228)63:9<1199::aid-app12>3.0.co;2-v

✦ Synopsis

In this article, we describe the synthesis and characterization of a new family of photoimageable dielectric insulating polymer films. Four different photoimageable thin films have been prepared from all-aromatic and aromatic/aliphatic copolyesters, which exhibit good photospeed (10-180 s, 15.5 mW/cm 2 intensity), resolution and line width (10 mm), thermal stability (330-400ЊC), adhesion on different substrates, mechanical strength, and reasonable glass transition temperature (120-150ЊC). One feature of the new photoimageable copolyester is the formation of a low dielectric constant film (2.5 at 1 kHz, 25ЊC) upon curing at temperatures up to 280ЊC. The low dielectric constant is a result of foaming arising from evolution of by-products during curing.