𝔖 Bobbio Scriptorium

✦ LIBER ✦

New monitor controls impurities during semiconductor sputtering processes

Publisher: Elsevier Science
Year: 1993
Tongue: English
Weight: 176 KB
Volume: 44
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(93)90018-6

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

New evidence of free carrier absorption

New evidence of free carrier absorption by photon-ionized-impurity-plasmon processes in semiconductors

✍ W. Szuszkiewicz; A.M. Witowski 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 278 KB

New controller suited for applications r

New controller suited for applications requiring process control, accurate pressure monitoring and rapid, repetitive pumping

📂 Article 📅 1988 🏛 Elsevier Science 🌐 English ⚖ 215 KB

Interaction of defects and impurities in

Interaction of defects and impurities in semiconductors during the process of ion bombardment: B I Vikhrev et al, Struc Defects in Semicon, Coll, Novosibirsk 1973, 215–218 (in Russian)

📂 Article 📅 1975 🏛 Elsevier Science 🌐 English ⚖ 139 KB

Modeling of the Flexible Disk Grinding P

Modeling of the Flexible Disk Grinding Process. Part II. Control and Optimization: S. M. Yoo, D. A. Dornfeld, Monitoring and Control for Manufacturing Processes, Vol PED 44, Dallas, TX. pp. 225–236. ASME, New York, NY. 1990

📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 134 KB

Modeling of the Flexible Disk Grinding P

Modeling of the Flexible Disk Grinding Process. Part I. Model Development: S. M. Yoo, D. A. Dornfeld, R. Lemaster, Monitoring and Control for Manufacturing Processes, Vol PED 44, Dallas, TX, 1990. pp. 213–224. ASME, New York, NY

📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 134 KB

Monitoring and Control for Manufacturing

Monitoring and Control for Manufacturing Processes: S. Y. Liang, T. Tsao, Vol PED 44, Dallas, TX. Winter Annual Meeting of the American Society of Mechanical Engineers. 482 pages. ASME, New York, NY, USA. 1990

📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 134 KB