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New microlithography technologies based on resist irradiation by low energy electrons

✍ Scribed by V.A. Kudryashov; T.B. Borzenko; V.V. Krasnov; V.V. Aristov

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 367 KB
Volume: 23
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(94)90162-7

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