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New high temperature stable positive photoresists based on hydroxy polyimides and polyamides containing the hexafluoroisopropylidene (6-f) linking group

✍ Scribed by D. N. Khanna; W. H. Mueller


Book ID
104522524
Publisher
Society for Plastic Engineers
Year
1989
Tongue
English
Weight
490 KB
Volume
29
Category
Article
ISSN
0032-3888

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