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New challenges for 300 mm Si technology: 3D interconnects at wafer scale by aligned wafer bonding

✍ Scribed by V. Dragoi; P. Lindner; M. Tischler; C. Schaefer


Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
281 KB
Volume
5
Category
Article
ISSN
1369-8001

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