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New Aspects on the Reduction of Nitric Acid during Wet Chemical Etching of Silicon in Concentrated HF/HNO 3 Mixtures

✍ Scribed by Steinert, M.; Acker, J.; Wetzig, K.


Book ID
120239606
Publisher
American Chemical Society
Year
2008
Tongue
English
Weight
174 KB
Volume
112
Category
Article
ISSN
1932-7447

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