130 nm, ~20 X & ±1 ) and SiO 2 (~15 nm) films. The deposition was performed by RF sputtering in 2.5 deposition cycles (1 cycle » 0.8 lm) at a deposition rate of 1.5 nm s ±1 and a pressure below 1.0 10 ±5 torr. Aluminum anodization was carried out in a 10 % phosphoric acid solution at 130 V and 7 C.
✦ LIBER ✦
New Approaches to Hybrid Polymers that Contain Phosphazene Rings
✍ Scribed by Harry R. Allcock
- Book ID
- 106416857
- Publisher
- Springer
- Year
- 2007
- Tongue
- English
- Weight
- 280 KB
- Volume
- 17
- Category
- Article
- ISSN
- 1053-0495
No coin nor oath required. For personal study only.
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