✦ LIBER ✦
New applications of low temperature PECVD silicon nitride films for microelectronics device fabrication : M. D. Dange, J. Y. Lee and K. Sooriakumar. Microelectron. J. 22(7–8), 19 (1991)
- Publisher
- Elsevier Science
- Year
- 1992
- Tongue
- English
- Weight
- 115 KB
- Volume
- 32
- Category
- Article
- ISSN
- 0026-2714
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