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Neutralization of Acceptors and Formation of Agglomerates in Silicon Wafers Due to Intrinsic Point Defects Created by Chemomechanical Polishing and by Quenching

✍ Scribed by Reichel, J. ;Sevcik, S.


Book ID
105380142
Publisher
John Wiley and Sons
Year
1987
Tongue
English
Weight
573 KB
Volume
103
Category
Article
ISSN
0031-8965

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