Neural network modelling of a compliant device to enhance and simplify compliant force control

Run-to-run process control of a plasma e

Run-to-run process control of a plasma etch process with neural network modelling

✍ Jill P. Card; Mark Naimo; William Ziminsky 📂 Article 📅 1998 🏛 John Wiley and Sons 🌐 English ⚖ 250 KB 👁 2 views

Run-to-run control of a plasma etch process for 8 inch diameter silicon wafers at Digital Semiconductor is determined by maintenance of targeted values of post-etch metrology variables. The post-etch quality variables are extremely sensitive to variation in the etch chamber conditions due to fluctua