Negative ion formation through dissociative electron attachment to the group IV tetrabromides: Carbon tetrabromide, silicon tetrabromide and germanium tetrabromide

✍ Scribed by Ómarsson, F.H.; Reynisson, B.; Brunger, M.J.; Hoshino, M.; Tanaka, H.; Limão-Vieira, P.; Ingólfsson, O.

• Book ID: 122302247
• Publisher: Elsevier Science
• Year: 2014
• Tongue: English
• Weight: 721 KB
• Volume: 365-366
• Category: Article
• ISSN: 1387-3806
• DOI: 10.1016/j.ijms.2014.01.008