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Negative ion formation through dissociative electron attachment to GeH4: Comparative studies with CH4 and SiH4

✍ Scribed by M. Hoshino; Š. Matejčík; Y. Nunes; F. Ferreira da Silva; P. Limão-Vieira; H. Tanaka


Book ID
113652541
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
403 KB
Volume
306
Category
Article
ISSN
1387-3806

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