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Negative copper ion implantation into silica glasses at high dose rates and the optical measurements

โœ Scribed by N. Kishimoto; V.T. Gritsyna; K. Kono; H. Amekura; T. Saito


Book ID
114168959
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
429 KB
Volume
127-128
Category
Article
ISSN
0168-583X

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