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Negative bias temperature instability (NBTI) in SiO2 and SiON gate dielectrics understood through disorder-controlled kinetics

✍ Scribed by B. Kaczer; V. Arkhipov; M. Jurczak; G. Groeseneken


Book ID
108207472
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
165 KB
Volume
80
Category
Article
ISSN
0167-9317

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