Negative bias instability in silicon dioxide films grown using oxidise-etch-oxidise process

✍ Scribed by B.P. Rai; R. Dwivedi; S.K. Srivastava

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 230 KB
• Volume: 35
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/0038-1101(92)90192-f