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Nearly damage - free dry etching of AlGaInP/GaInP by electron cyclotron resonance technique

✍ Scribed by J. Hommel; F. Schneider; M. Moser; C. Geng; F. Scholz; H. Schweizer


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
307 KB
Volume
23
Category
Article
ISSN
0167-9317

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