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NEAR EDGE X-RAY ABSORPTION AND X-RAY PHOTOELECTRON DIFFRACTION STUDIES OF THE STRUCTURAL ENVIRONMENT OF Ge–Si SYSTEMS

✍ Scribed by CASTRUCCI, P.; GUNNELLA, R.; PINTO, N.; BERNARDINI, R.; DE CRESCENZI, M.; SACCHI, M.

No coin nor oath required. For personal study only.

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