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[NATO Science Series II: Mathematics, Physics and Chemistry] Defects in High-k Gate Dielectric Stacks Volume 220 || MAGNETIC DEFECTS IN PRISTINE AND HYDROGENTERMINATED NANODIAMONDS

โœ Scribed by Gusev, Evgeni


Book ID
117999079
Publisher
Kluwer Academic Publishers
Year
2006
Tongue
English
Weight
167 KB
Edition
2006
Category
Article
ISBN-13
9781402043659

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โœฆ Synopsis


The main goal of this book is to review at the nano and atomic scale the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. One of the key obstacles to integrate this novel class of materials into Si nano-technology are the electronic defects in high-k dielectrics. It has been established that defects do exist in high-k dielectrics and they play an important role in device operation. The unique feature of this book is a special focus on the important issue of defects. The subject is covered from various angles, including silicon technology, processing aspects, materials properties, electrical defects, microstructural studies, and theory. The authors who have contributed to the book represents a diverse group of leading scientists from academic, industrial and governmental labs worldwide who bring a broad array of backgrounds (basic and applied physics, chemistry, electrical engineering, surface science, and materials science). The contributions to this book are accessible to both expert scientists and engineers who need to keep up with leading edge research, and newcomers to the field who wish to learn more about the exciting basic and applied research issues relevant to next generation device technology.


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โœ Gusev, Evgeni ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Kluwer Academic Publishers ๐ŸŒ English โš– 825 KB

The main goal of this book is to review at the nano and atomic scale the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. One of the key obstacles to integrate this novel class of materials into S

[NATO Science Series II: Mathematics, Ph
โœ Gusev, Evgeni ๐Ÿ“‚ Article ๐Ÿ“… 2006 ๐Ÿ› Kluwer Academic Publishers ๐ŸŒ English โš– 389 KB

The main goal of this book is to review at the nano and atomic scale the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. One of the key obstacles to integrate this novel class of materials into S