Nanostructured Polymer Films by Electron-Beam Irradiation and Selective Metallization

✍ Scribed by Ingo Lieberwirth; Frank Katzenberg; Jürgen Petermann

• Publisher: John Wiley and Sons
• Year: 1998
• Tongue: English
• Weight: 387 KB
• Volume: 10
• Category: Article
• ISSN: 0935-9648
• DOI: 10.1002/(sici)1521-4095(199809)10:13<997::aid-adma997>3.0.co;2-n

✦ Synopsis

dibromides to monobromide: 0.1) dissolved in 1 mL degassed toluene was added and the reaction continued for 12 h. The polymers were precipitated by addition of the hot solution dropwise to an equivolume mixture of concentrated HCl, methanol, and acetone. The isolated polymers were then dissolved in toluene or methylene chloride and reprecipitated with methanol± acetone (1/1). The copolymers were dried at 80 C (in vacuum). The isolated copolymer yields were good (79±85 %).

Device Fabrication: ITO was deposited on borosilicate glass substrates by reactive sputtering in Ar/N 2 O as described previously [24,25]. PAni was then spin-coated from aqueous solution to a thickness of approximately 100 nm. The layer of poly(dialkylfluorene-co-anthracene), 80±120 nm in thickness, was spin-coated from 3 % p-xylene solution in a dry nitrogen glove-box and dried in vacuum at room temperature for at least 12 h. The samples were loaded directly from the glove-box into the vacuum evaporator for the thermal deposition of Ca (25 nm). Finally a protective layer of 25 nm of Al was added to the Ca.