Nanometer-Scale Conversion of Si3N4 to SiOx for Applications in Lithography, Micromachining, and Selective-Area CVD

✍ Scribed by Gwo, S. ;Chen, T.T. ;Yasuda, T. ;Yamasaki, S.

• Publisher: John Wiley and Sons
• Year: 2001
• Tongue: English
• Weight: 153 KB
• Volume: 188
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/1521-396x(200111)188:1<383::aid-pssa383>3.0.co;2-d