Intended To Update Scientists And Engineers On The Current State Of The Art In A Variety Of Key Techniques Used Extensively In The Fabrication Of Structures At The Nanoscale. The Present Work Covers The Essential Technologies For Creating Sub 25 Nm Features Lithographically, Depositing Layers With N
β¦ LIBER β¦
Nanofabrication by direct epitaxial growth
β Scribed by Gyula Eres; F.Y.C. Hui; T.G. Thundat; D.C. Joy
- Book ID
- 114155846
- Publisher
- Elsevier Science
- Year
- 1998
- Tongue
- English
- Weight
- 312 KB
- Volume
- 41-42
- Category
- Article
- ISSN
- 0167-9317
No coin nor oath required. For personal study only.
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